Quantitative Makyoh topography  Page description

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Details of project

  
Identifier
37711
Type K
Principal investigator Riesz, Ferenc
Title in Hungarian Kvantitatív Makyoh-topográfia
Title in English Quantitative Makyoh topography
Panel Informatics and Electrical Engineering
Department or equivalent MTA Research Institute for Technical Physics and Materials Science
Participants Eördögh, Imre
Laczik, Zsolt
Lukács, István Endre
Makai, János
Starting date 2002-01-01
Closing date 2006-12-31
Funding (in million HUF) 13.110
FTE (full time equivalent) 0.00
state closed project





 

Final report

  
Results in Hungarian
A korszerű félvezető-technológiában alapvető fontosságú a szeletek felületi morfológiájának, az ideális síkjellegtől való eltérésének a minősítése. A korszerű nagy átmérőjű szeletek megjelenésével a síkjelleg problémája és így a megfelelő minősítési eljárás szükségessége fokozottabban jelentkezik. A jelen pályázat témája egy, a Távol-Keletről származó ősi, „mágikus” tulajdonságú tükör elvén alapuló optikai vizsgálati módszer, a Makyoh-topográfia alkalmassá tétele igényes metrológiai célokra. A kutatás során új koncepciójú, nagy méretű minták vizsgálatára alkalmas mérési összeállításokat valósítottunk meg. Tanulmányoztuk a felületi domborzat visszanyerésére szolgáló eljárások érzékenységét és pontosságát, valamint a leképezés alapvető tulajdonságait. A kidolgozott mérési eljárást számos félvezető-technológiai és egyéb kutatásban alkalmaztuk. Lépéseket tettünk a mérési eljárás gazdasági hasznosítása érdekében.
Results in English
The assessment of the surface morphology and flatness of the wafers is a key issue in modern semiconductor technology. The need for a proper flatness characterisation method became even more important with the advent of today’s large-diameter wafers. The aim of the present project is to make Makyoh topography, an optical characterisation tool based on an ancient „magic” mirror of Far-East origin suitable for advanced metrological purposes. During our research, we have constructed novel measurement set-ups suitable for the study of large-diameter samples. We have studied the sensivity and accuracy of the numerical methods for the reconstruction of the surface topography and investigated the basic characteristics of the imaging mechanism. The developed methods have been applied in semicondutor technolgy research as well as in other areas. We have taken steps forward the industrial exploitation.
Full text http://real.mtak.hu/319/
Decision
Yes





 

List of publications

  
F. Riesz, L. D. Pramatarova, R. Pramatarova, A. L. Tóth: Makyoh-topography studies of the morphology of the cross sections of renal stones, J. Crystal Growth 245(1-2) pp. 101-108, 2002
F. Riesz: Makyoh topography: a simple yet powerful optical method for flatness and defect characterisation of mirror-like surfaces (meghívott)), Photonics Europe, 26-30 April 2004, Strasbourg, Proc. SPIE 5458, pp. 86-100, 2004
F. Riesz: Optical methods in MEMS testing, Encyclopedia of Sensors, Eds. C. A. Grimes, E. Dickey, M. V. Pishko, American Scientific Publishers, Vol. 7, 199-226, 2006
F. Riesz: Makyoh topography: a simple yet powerful optical method for surface flatness and defect characterisation (meghívott), Defect Diff. Forum, 221-223, 51-61, 2003
F. Riesz: Makyoh-topography assessment of the deformation of micromachined membrane structures on double-side coated substrates, Sensors Actuators A 102(1-2) pp. 123-129, 2002
I. E. Lukács, Zs. Vízváry, P. Fürjes, F. Riesz, Cs. Dücső, I. Bársony: Determination of deformation induced by thin film residual stress in structures of millimetre size, Spring Meeting of the European MRS, June 5-8, 2001, Strasbourg, France; Adv. Engin. Mater. 4(8) pp. 625-627, 2002
I. E. Lukács, F. Riesz, Z. J. Laczik: High spatial resolution Makyoh topography using shifted grid illumination, Phys. Stat. Sol. A 195(1) pp. 271-276, 6th Intl. Workshop on Expert Evaluation and Control of Compound Semiconductor Materials and Technologies, 26-29 May, 2002, Budapest, 2003
F. Riesz, I. E. Lukács, Cs. Dücső, B. Szentpáli, K. Hjort: Makyoh-topography studies of the deformation of micromachined membrane structures, 3rd Workshop ''Micromachined Circuits for Microwave and Millimeter Wave Applications'', 9 Oct, 2001, Sinaia; Ser Micro and Nanoeng Vol. 2, pp. 93-101, 2002
I. E. Lukács, F. Riesz: Error analysis of Makyoh-topography surface height profile measurements, Eur. Phys. J. Appl. Phys. 27(1-3) 385-388, 10th Intl. Conf. Defect Recognition, Imaging and Phys. in Semiconductors (DRIP-X), 29 Sept. - 2 Oct. 2003, Batz-sur-Mer, 2004
Zs. J. Horváth, L. K. Orlov, V. Rakovics, N. L. Ivina, A. L. Tóth, E. S. Demidov, F. Riesz, V. I. Vdovin, Z. Pászti: Effect of crystal defects on the electrical behaviour of InP and SiGe epitaxial structures, Eur. Phys. J. Appl. Phys. 27(1-3) 189-192, 10th Intl. Conf. on Defects Recognition, Imaging and Phys in Semiconductors (DRIPX), 29 Sept. 2 Oct. 2003, Batz-sur-Mer, 2004
I. E. Lukács, J. P. Makai, F. Riesz, I. Eördögh, B. Szentpáli, I. Bársony, I. Réti, A. Nutsch: Wafer flatness measurement by Makyoh (magic-mirror) topography for in-line process control, Proc. 5th European Advanced Equipment Control / Advanced Process Control (AEC/APC) Conference, April 14-16, 2004, Dresden, Germany, Contribution P514., 2004
I. E. Lukács, P. Fürjes, Cs. Dücső, F. Riesz, I. Bársony: Process monitoring of MEMS technology by Makyoh topography, Proc. 13th Micromechanics Europe Workshop (MME 2002), 6-8 October, 2002, Sinaia, Romania, pp. 283-286, 2002
I. E. Lukács, Z. J. Laczik, F. Riesz: Improved spatial resolution of Makyoh topography using shifted grid illumination, 31st Int. School on Physics of Semiconducting Compounds, 7-14 June, 2002, Jaszowiec, Poland, Abstracts p. 118, 2002
I. E. Lukács, F. Riesz: Analysis of errors of Makyoh-topography surface height profile measurements, 32nd Int. School on Physics of Semiconducting Compounds, 30 May - 6 June, 2003, Jaszowiec, Poland, Abstracts p. 153, 2003
F. Riesz, J. Z. Domagala, Á. Nemcsics: Studies of structural properties on mismatched InGaAs/GaAs (001) heterostrutures by XRD method, 10th Joint Vacuum Conf., 28 Sept. - 2 Oct. 2004, Portoroz, Slovenia, Abstracts p. 66., 2004
F. Riesz, I. E. Lukács: Sensitivity and measurement errors of Makyoh topography, Phys. Stat. Sol. A 202(4) 584-589, 7th Expert Evaluation & Control of Compound Semiconductor Materials & Technologies. Montpellier, June 1-4, 2004, 2004
F. Riesz, J. Domagala, Á. Nemcsics: An x-ray diffraction study of the structural properties of thick relaxed (100) InGaAs/GaAs heterostructures, Phys. Stat. Sol. C 2(4) 1298-1303, 7th Expert Evaluation & Control of Compound Semiconductor Materials & Technologies. Montpellier, June 1-4, 2004, 2005
L. Pramatarova, E. Pecheva, D. Nesheva, Z. Aneva, A. L. Toth, E. Horvath, F. Riesz: Hydroxyapatite growth on glass/CdSe/SiOx nanostructures, Solid State Phenomena,106, 123-126, 2004 E-MRS Fall Meeting, 6-10 Sept. Warsaw, 2005
I. E. Lukács, F. Riesz: Makyoh-topography assessment of etch and polish removal of processed circuits for substrate re-use, Microel. Engin. 65(4), 380-386, 2003
L. Pramatarova, E. Pecheva, V. Krastev, F. Riesz: Ion implantation modified stainless steel as a substrate for hydroxyapatite deposition. Part I. Surface modification and characterization, J. Materials Science: Materials in Medicine, megjelenés alatt., 2007
F. Riesz, I. E. Lukács: Sensitivity of Makyoh topography, 33rd Int. School on Physics of Semiconducting Compounds, 4–10 June, 2005, Jaszowiec, Poland, Abstracts p. 63., 2005
F. Riesz: Sensitivity of Makyoh topography, Mater. Sci. Semicond. Proces., 9 (2006) 220-2211th Int. Conf. Defects: Recognition, Imaging and Physics in Semiconductors, Sept. 11-15 2005, Beijing, 2005
F. Riesz, L. D. Pramatarova, E. V. Pecheva, M. Dimitrova: Application of Makyoh (magic-mirror) topography in the research of artificial biomineralisation, J. Optoelectron. Adv. Mater. 9 (1) 201-204, 14th International School on Condensed Matter Physics, 17-22, September, 2006, Varna, 2007
J. P. Makai, F. Riesz, I. E. Lukács: : Practical realizations of the Makyoh (magic mirror) arrangement for the investigation of large area mirror-like surfaces, Proc. Third International Conference on Metrology, Tel Aviv, November 14-16, 2006 [CD-ROM], 2006
J. P. Makai, F. Riesz, I. E. Lukács, T. Makai: Surface topography of large area mirror-like surfaces by the Makyoh (magic mirror) method, CIE Session, 4-11 July 2007, Peking, elfogadva, 2007
F. Riesz: A note on ‘Oriental magic mirrors and the Laplacian image’, Eur. J. Phys. 27, N5-N7, 2006
Lukács I. E.: Makyoh-topográfia tükörjellegű felületek vizsgálatára, Ph. D. értekezés, BMGE, 2006
I. E. Lukács (23%), J. P. Makai (24%), L. Pfitzner (5%), F. Riesz (34%), B. Szentpáli (14%): Apparatus and measurement procedure for the fast, quantitative, non-contact topographic investigation of semiconductor wafers and other mirror like surfaces, European Patent EP 1 434 981 B1, July 5, 2006, 2006
I. E. Lukács (23%), J. P. Makai (24%), L. Pfitzner (5%), F. Riesz (34%), B. Szentpáli (14%): Apparatus and measurement procedure for the fast, quantitative, non-contact topographic investigation of semiconductor wafers and other mirror like surfaces, US Patent 7,133,140 B2, November 7, 2006, 2006
Riesz F., Lukács I. E.: Kvantitatív Makyoh-topográfia tükörjellegű felületek simaságának a vizsgálatára, BKL – Kohászat 138(2), 45-50, 2005
F. Riesz, I. E. Lukács, J. P. Makai: Realisation of quantitative Makyoh topography using a Digital Micromirror Device, SPIE European Symposium on Optical Metrology, 18-22 June 2007, Munich, elfogadott előadás., 2007



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